The selected process and post-process parameters for Taguchi L25 DOE. (layer thickness was selected as a constant value of 40 µm for all experiments)
| Laser power (W) | Scan speed (mm/s) | Hatch spacing (µm) | Scanning pattern angle (°) | Heat treatment temperature (°C) | Average relative density (%) |
|---|---|---|---|---|---|
| 150 | 650 | 60 | 36 | 20 | 98.34 |
| 175 | 700 | 65 | 40 | 425 | 98.74 |
| 200 | 750 | 70 | 45 | 650 | 98.78 |
| 225 | 800 | 75 | 60 | 870 | 98.96 |
| 250 | 850 | 80 | 72 | 1150 | 98.99 |
| Laser power (W) | Scan speed (mm/s) | Hatch spacing (µm) | Scanning pattern angle (°) | Heat treatment temperature (°C) | Average relative density (%) |
|---|---|---|---|---|---|
| 150 | 650 | 60 | 36 | 20 | 98.34 |
| 175 | 700 | 65 | 40 | 425 | 98.74 |
| 200 | 750 | 70 | 45 | 650 | 98.78 |
| 225 | 800 | 75 | 60 | 870 | 98.96 |
| 250 | 850 | 80 | 72 | 1150 | 98.99 |
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