Summary of different TE materials under low-temperature conditions
| Materials | Majority carriers | Temperature: K | ZT value | References |
|---|---|---|---|---|
| Bi85Sb14Pb1 | Holes | 190–210 | 0.11–0.12 | Chen et al.95,96 |
| Bi77.1Sb22.9 | Holes | 240 | 0.13 | Jin et al.97 |
| Bismuth telluride | — | 423 | 0.61 | Kim et al.98 |
| AgSbSe0.25Te1.75 | Holes | 520 | 0.65 | Wojciechowski and Schmidt99 |
| Bismuth telluride | Electrons | 300–475 | 0.68–1.16 | Guo et al.,100 Bao et al.,101 Akshay et al.,102,103 Yang et al.,104 Nour et al.,105 Saleemi et al.,106 Wu et al.107 |
| CsBi4Te6 | Holes | 225 | 0.82 | Chung et al.108 |
| (Bi2Te3)0.9(Bi1.9Cu0.1Se3)0.1 | Electrons | 417 | 0.98 | Cui et al.109 |
| Silicon | Holes | 200 | ∼1.00 | Boukai et al.110 |
| Bi2(Te,Se)3 | Electrons | 300 | 1.01 | Tan et al.111 |
| MgAgSb0.99In0.01 | Holes | 525 | ∼1.10 | Ying et al.112 |
| Bi2Te2.7Se0.3 | Electrons | 300–480 | 0.85–1.27 | Yan et al.,113 Hong et al.,114 Tan et al.,115 |
| (Bi2Te3)0.24(Sb2Te3)0.76 | Holes | 350 | 1.14 | Jiang et al.116 |
| Bi2Te2.5Se0.5 | Electrons | 300–463 | 1.18–1.28 | Xu et al.,117 Tan et al.118 |
| Bi2Te2.3Se0.69 | Electrons | 450 | ∼1.20 | Zhai et al.119 |
| Bi2Te2.79Se0.21 | Electrons | 357 | 1.20 | Hu et al.120 |
| Bi2Te2.88Se0.15 | Electrons | 298–423 | 1.18–1.22 | Kim et al.121 |
| Bi0.3Sb1.7Te3 | Holes | 380 | 1.30 | Hu et al.122 |
| (Bi2Te3)0.20(Sb2Te3)0.80 | Holes | 398 | 1.33 | Di et al.123 |
| BiSbTe bulk alloy | Holes | 300–373 | 1.20–1.40 | Poudel et al.124 |
| Bi0.4Sb1.6Te3 | Holes | 300–398 | 1.20–1.41 | Jimenez et al.,125 Chen et al.,126 Yeo and Oh127 |
| (Bi,Sb)2Te3 | Holes | 273 | 1.41 | Fan et al.128 |
| (Bi,Sb)2Te3 bulk composites | Holes | 440 | 1.47 | Cao et al.129 |
| Bi0.48Sb1.52Te3 | Holes | 390 | 1.50 | Xie et al.130 |
| Bi0.52Sb1.48Te3 | Holes | 300 | ∼1.56 | Xie et al.131 |
| Bi0.50Sb1.50Te3 | Holes | 300–323 | 1.56–1.80 | Jiang et al.,132 Lv et al.133 |
| PbSnSeTe | — | 300 | 2.00 | Harman et al.134 |
| Tellurium-embedded bismuth telluride | Electrons | 375 | 2.27 | Choi et al.135 |
| Iodine-doped copper (I) selenide | — | 400 | 2.30 | Liu et al.136 |
| Bismuth telluride/Sb2Te3 superlattice | Holes | 300 | ∼2.40 | Venkatasubramanian et al.137 |
| Materials | Majority carriers | Temperature: K | References | |
|---|---|---|---|---|
| Bi85Sb14Pb1 | Holes | 190–210 | 0.11–0.12 | Chen |
| Bi77.1Sb22.9 | Holes | 240 | 0.13 | Jin |
| Bismuth telluride | — | 423 | 0.61 | Kim |
| AgSbSe0.25Te1.75 | Holes | 520 | 0.65 | Wojciechowski and Schmidt |
| Bismuth telluride | Electrons | 300–475 | 0.68–1.16 | Guo |
| CsBi4Te6 | Holes | 225 | 0.82 | Chung |
| (Bi2Te3)0.9(Bi1.9Cu0.1Se3)0.1 | Electrons | 417 | 0.98 | Cui |
| Silicon | Holes | 200 | ∼1.00 | Boukai |
| Bi2(Te,Se)3 | Electrons | 300 | 1.01 | Tan |
| MgAgSb0.99In0.01 | Holes | 525 | ∼1.10 | Ying |
| Bi2Te2.7Se0.3 | Electrons | 300–480 | 0.85–1.27 | Yan |
| (Bi2Te3)0.24(Sb2Te3)0.76 | Holes | 350 | 1.14 | Jiang |
| Bi2Te2.5Se0.5 | Electrons | 300–463 | 1.18–1.28 | Xu |
| Bi2Te2.3Se0.69 | Electrons | 450 | ∼1.20 | Zhai |
| Bi2Te2.79Se0.21 | Electrons | 357 | 1.20 | Hu |
| Bi2Te2.88Se0.15 | Electrons | 298–423 | 1.18–1.22 | Kim |
| Bi0.3Sb1.7Te3 | Holes | 380 | 1.30 | Hu |
| (Bi2Te3)0.20(Sb2Te3)0.80 | Holes | 398 | 1.33 | Di |
| BiSbTe bulk alloy | Holes | 300–373 | 1.20–1.40 | Poudel |
| Bi0.4Sb1.6Te3 | Holes | 300–398 | 1.20–1.41 | Jimenez |
| (Bi,Sb)2Te3 | Holes | 273 | 1.41 | Fan |
| (Bi,Sb)2Te3 bulk composites | Holes | 440 | 1.47 | Cao |
| Bi0.48Sb1.52Te3 | Holes | 390 | 1.50 | Xie |
| Bi0.52Sb1.48Te3 | Holes | 300 | ∼1.56 | Xie |
| Bi0.50Sb1.50Te3 | Holes | 300–323 | 1.56–1.80 | Jiang |
| PbSnSeTe | — | 300 | 2.00 | Harman |
| Tellurium-embedded bismuth telluride | Electrons | 375 | 2.27 | Choi |
| Iodine-doped copper (I) selenide | — | 400 | 2.30 | Liu |
| Bismuth telluride/Sb2Te3 superlattice | Holes | 300 | ∼2.40 | Venkatasubramanian |
Majority carriers: holes (p type) and electrons (n type)