Plasma chips fabricated in ceramic technology
| Description | Application | References |
|---|---|---|
| APGD and a gas flowing through chamber | Technology presentation | Yamamoto et al. (2008) |
| Dielectric barrier discharge (DBD) and a gas flowing through chamber inside a ceramic chip with open electrodes | Gas spectroscopy | Macioszczyk et al. (2016b) |
| BDB with a gas flowing through chamber | Gas excitation | Vojak et al. (2001) |
| RF microplasma-generating discharge | Technology presentation | Baker et al. (2006) |
| DBD between buried electrodes in a ceramic chip | Selective treatment of cell cultures | Fischer et al. (2017) |
| APGD between a liquid cathode and a solid anode inside a ceramic chip; discharge wastes are freely dropped out from a chip | Analytical atomic spectrometry | Macioszczyk et al. (2016a) |
| APGD between a liquid cathode and a solid anode inside a ceramic chip; the cathode evaporates in a chamber | Analytical atomic spectrometry | Macioszczyk et al. (2017a) |
| DBD between ceramic electrodes | Production of plasma activated water | Macioszczyk et al. (2017b) |
| Application | References | |
|---|---|---|
| Technology presentation | ||
| Gas spectroscopy | ||
| Gas excitation | ||
| Technology presentation | ||
| Selective treatment of cell cultures | ||
| Analytical atomic spectrometry | ||
| Analytical atomic spectrometry | ||
| Production of plasma activated water |
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