Electrodeposition of rhodium metal on titanium substrates

The electrodeposition of any metal over titanium substrates meets with many problems due to the formation of a non‐conductive layer of titanium oxide on the surface of substrates during the electroplating process. Trials were made to overcome these problems by the pre‐anodisation of titanium substrates in oxalic acid solution of concentration 100g/l, at high current density of 60‐95mA/cm^–2, and at ambient temperature. In these conditions, a thin, porous and conductive titanium oxide film can be obtained, which will then support electroplating processes. Rhodium metal was electrodeposited over the anodised titanium substrates from a bath consisting of Rh₂(SO₄)₃, 5.2g/l and H₂SO₄, 100g/l. At optimum conditions of electroplating, the rhodium electrodeposits were formed over the anodised titanium substrate with high adhesion, brightness and high current efficiency (92.05 per cent).