CORROSION RESEARCH ROUND‐UP

U.S.A. Effect of silicon on high temperature oxidation of stainless steels. Growth of oxide films at 600 and 800°C. on a series of 16 Cr‐10 No‐balance Fe stainless steels with silicon contents ranging from 0.17 to 3.55% was studied by electron microscopy electron diffraction, x‐ray diffraction, and x‐ray fluorescence analysis techniques. Oxide scales and sub‐scales formed during oxidation at 1,000°C. were studied optically in cross‐section as well as by x‐ray diffraction and fluorescence analysis. Results show that, as silicon content increases, oxidation resistance increases rapidly until at the high silicon level, 3.55%, a very thin oxide film is formed at 600 and 800°C. and very little oxide scale forms at 1,000°C.