TRANSIENT SIMULATION OF SILICON DEVICES UNDER HIGH CARRIER INJECTION. COMPARISON OF VARIOUS TIME STEPPING SCHEMES

This paper presents an approach to the time discretization of electron and hole continuity equations in semiconductors. We propose a nth order backward differentiation formula with variable stepsize determined by a local truncation error evaluation. Up to the fifth order is examined. As an example, the effect of a heavy ion (63Cu , 70 MeV) on a silicon diode is simulated with a 3D axi‐symmetrical model, using various time stepping schemes. The results obtained are compared. For this particular problem and the mesh considered, the third order is the most efficient one to reduce the calculation time.