AN EFFICIENT DIFFUSION ALGORITHM FOR 2‐D VLSI PROCESS MODELING CODE

The coupled set of non‐linear 2D diffusion equations for donor and acceptor type impurities with initial and appropriated boundary conditions is solved by an implicit locally‐one dimensional finite difference method. Numerical experiments have been made to achieve a reasonable trade‐off between the desired accuracy and the CPU time. The algorithm was implemented to the process module of the 2‐D integrated process and device modeling system IMPEDANCE 2.0.