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Major trends in the PWB industry and the requirements from the manufacturers to reduce reject rates at the imaging and chemical process stages have demanded a new generation of dry film photoresists. Details are given of the requirements laid down by the industry, how the dry film resist manufacturers have responded, and how the improved resist technology meets these demands. These latest products are extensively available in Europe and resist improvements have been welcomed by the board manufacturers.
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© MCB UP Limited
1988
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