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Volume 7, Issue 3
1 February 1981
Circuit World Cover Image for Volume 7, Issue 3
Review Article| February 01 1981

Electron Beam Lithography at the Rutherford Laboratory Available to Purchase

R.A. Lawes
R.A. Lawes
Science Research Council, Rutherford Laboratory, Chilton, OXON.
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Author & Article Information
Publisher: Emerald Publishing
Online ISSN: 1758-602X
Print ISSN: 0305-6120
© MCB UP Limited
1981
Circuit World (1981) 7 (3): 60–63.
https://doi.org/10.1108/eb043644

The Science Research Council has opened a mask‐making facility at the Rutherford Laboratory based on the EBMF‐2 Electron Beam Microfabricator. Ancillary equipment designed to support the EBM resolves features down to 1 micron or below. The paper discusses the principles, design parameters and the performance of the EBM and outlines mask manufacturing procedure.

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© MCB UP Limited
1981
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