Du Pont introduces new dry film photoresist series for chemical milling

Du Pont introduces new dry film photoresist series for chemical milling

Keywords Du Pont,Milling, Photoresist

Du Pont has introduced a new series of photopolymer dry film resists, which have been developed specifically to meet the needs of the photochemical machining industry. Called the Riston CM 200 Series, the new dry film imaging resists are available in thicknesses of 15 and 25 microns, and offer superior durability and adhesion, as well as fine line resolution of better than 25 microns.

According to Phil Britton,Riston product manager: "Chemical milling is a very demanding application for photoresists, requiring durability and adhesion on a wide variety of surfaces. Recently, increasing demand for more complex parts fabricated with exotic materials has pushed these resists to their limits. Riston CM 200 Series resists meet the needs of these applications by demonstrating broader versatility. They withstand the long dwell times in harsh chemistries required for etching corrosion-resistant alloys such as stainless steel, yet have the flexibility to conform to pliable metal surfaces.

CM 200 Series is also suitable for photo-electroforming, which involves the use of selective copper or nickel plating for the creation of precise, thin metal parts for aerospace applications, computers, FRI and EMI shielding, flexible circuits, and medical instruments.

For further information,please contact: Du Pont de Nemours International SA. Tel: +41 22 717 52 54; Fax:+41 22 717 62 70; E-mail: David.Stone@che.dupont.com