The purpose of this study is to investigate the behavior of a rotating semiconductor micropolar elastic medium under photothermal excitation, incorporating the refined-multi-phase-lag theories along with a hydrostatic initial stress. The research paper aims to analyze the interactions between thermal, elastic, micropolar and plasma waves and evaluate how parameters such as thermal relaxation times, rotation and hydrostatic initial stress influence the field distribution of the physical variables.
Using the normal mode method, analytical expressions for the displacement, normal stress, temperature, carrier density, couple stress and microrotation are obtained by satisfying the mechanical, thermal and plasma boundary conditions at the surface. Four thermoelastic theories are compared, while the effects of rotation, hydrostatic initial stress and thermoelectric coupling are investigated exclusively for the refined multi-phase-lags.
The results show that the multi-phase-lags, rotation, thermoelectric coupling and initial stress significantly affect all physical fields, altering amplitudes and wave behavior of the variables.
This work integrates micropolar thermoelasticity with the refined multi-phase-lags model together with an angular rotation and a hydrostatic initial stress, providing improved predictive capability over classical thermoelastic models.
