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The current paper is about the descriptions of the topography and compositional, optical and structural characteristics of cost-effective and non-toxic titanium dioxide (TiO2) thin film deposited using the chemical bath deposition (CBD) method on a glass substrate for the transparent conductive oxide layer in solar cell application. The specimens were characterized by various instrumentation techniques such as X-ray diffraction (XRD), ultraviolet (UV)–visible–near-infrared spectrometry and field emission scanning electron microscopy (FESEM) coupled with elemental analysis (energy-dispersive X-ray spectroscopy). The XRD results indicated a perfect polycrystalline titanium dioxide phase. UV spectrophotometry of the titanium dioxide thin film found a bandgap of 3.2 eV. At a glance, the morphology of the film by FESEM shows that the deposited film is crack-free and is deposited uniformly. The thickness of titanium dioxide is measured to be approximately equal to 100 nm.

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