...Punit Tyagi, BSc, MSc; Anjali Sharma, BSc, MSc, PhD; Monika Tomar, BSc, MSc, PhD; Vinay Gupta, BSc, MSc, PhD The radio-frequency sputtering technique has been used to deposit tin (IV) oxide (SnO₂) thin films on platinum (Pt) interdigital electrode-patterned glass substrates...

... substrates at room temperature by magnetron sputtering technique. Initially, ZnO thin films have been formed by oxidizing sputtered zinc films at different annealing temperatures (300–500°C) in ambient air for 1 h. The influence of ZnO buffer layer on the structural, morphological, optical and electrical...

...Deepak Raj Pattabiraman, MTech; Sudha Gupta, MSc; Sridharan Madanagurusamy, PhD Vanadium pentoxide (V₂O₅) thin films were deposited over thoroughly cleaned silicon dioxide (SiO₂)-coated silicon (Si) (100) substrates by reactive dc magnetron sputtering technique...

...Sudhakar Shet, PhD; Yanfa Yan, PhD; Heli Wang, PhD; Nuggehalli Ravindra, PhD; John Turner, PhD; Mowafak Al-Jassim, PhD ZnO and mixed ZnO:GaN thin films were synthesized on fluorine-doped tin oxide substrates by reactive radio frequency magnetron sputtering in mixed N2 and O2 ambient. Mixed ZnO:GaN...