The trend in wireless and mobile communications for broader bandwidth microwave circuitry, coupled with high packaging density and low cost fabrication has triggered investigations of new circuit configurations and technologies that meet these requirements. We have addressed these issues through the study of multilayer microwave structures using advanced thick‐film technology. The techniques described employ several layers of metal sandwiched by thick‐film dielectric. This leads to an efficient solution for system miniaturisation. The significance of this work is that it shows the multilayer approach to microwave structures, coupled with new thick‐film technology, offers a viable and economic solution to achieve high‐density, high‐performance microwave circuits.
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1 April 2003
Technical Paper|
April 01 2003
Multi‐layer thick‐film microwave components and measurements Available to Purchase
Zhengrong Tian;
Zhengrong Tian
Heraeus Circuit Materials Division, West Conshohocken, PA, USA
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Charles Free;
Charles Free
Heraeus Circuit Materials Division, West Conshohocken, PA, USA
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Colin Aitchison;
Colin Aitchison
Heraeus Circuit Materials Division, West Conshohocken, PA, USA
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Peter Barnwell;
Peter Barnwell
Heraeus Circuit Materials Division, West Conshohocken, PA, USA
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James Wood
James Wood
Heraeus Circuit Materials Division, West Conshohocken, PA, USA
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Publisher: Emerald Publishing
Online ISSN: 1758-812X
Print ISSN: 1356-5362
© MCB UP Limited
2003
Microelectronics International (2003) 20 (1): 17–20.
Citation
Tian Z, Free C, Aitchison C, Barnwell P, Wood J (2003), "Multi‐layer thick‐film microwave components and measurements". Microelectronics International, Vol. 20 No. 1 pp. 17–20, doi: https://doi.org/10.1108/13565360310455472
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