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Journal Articles

DC magnetron sputter‐deposited tungsten silicide films for microelectronic applications

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Jian‐Wei Hoon, Kah‐Yoong Chan, Teck‐Yong Tou
Journal: Microelectronics International
Microelectronics International (2011) 28 (2): 30–33.
https://doi.org/10.1108/13565361111127322
Published: 10 May 2011
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Journal Articles

Influence of process parameters on the substrate heating in direct current plasma magnetron sputtering deposition process

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Jegenathan Krishnasamy, Kah‐Yoong Chan, Teck‐Yong Tou
Journal: Microelectronics International
Microelectronics International (2010) 27 (2): 75–78.
https://doi.org/10.1108/13565361011034740
Published: 11 May 2010
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