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Keywords: Germanium oxide
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Journal Articles
Growth kinetic and composition of the interfacial layer for RF sputtering Al2O3 layer on germanium
Available to PurchaseSiti Kudnie Sahari, Muhammad Kashif, Norsuzailina Mohamed Sutan, Zaidi Embong, Nik Amni Fathi Nik Zaini Fathi, Azrul Azlan Hamzah, Rohana Sapawi, Burhanuddin Yeop Majlis, Ibrahim Ahmad
Journal:
Microelectronics International
Microelectronics International (2017) 34 (2): 64–68.
Published: 02 May 2017
... Licensed re-use rights only Interfacial layer HCl Germanium Germanium oxide HF X-ray photoelectron spectroscopy Germanium (Ge) becomes a candidate to replace silicon (Si) because it has four times the hole mobility and twice the electron mobility than Si for metal oxide field effect...
