Design of a 3‐degrees of freedom platform for the stereolithography apparatus

This paper presents the design of a 3 degrees of freedom build platform for a Stereo‐lithography Apparatus machine (older model without Zephyr coating). The Pahl and Beitz methodology is used to systematically design such a component. The various steps are illustrated and the final design described. The impetus for the research is the need to reduce layering errors in layer‐based machines. The final solution allows the platform to rotate along two axes and be elevated along the Z‐axis with minimal disruption to the present set‐up.