Methods and algorithms for the slicing process in microstereolithography

In this paper, methods and algorithms are presented for an efficient slicing process specifically designed for microstereolithography, a high‐resolution rapid prototyping technology. Modifications are given for different implementation environments (FPU, Parallel Computing, directly wired processes). They use the common STL‐format as the description of the 3D objects and compute bitmapped layers for the layered manufacturing step. Specific attention was paid to the requirements for flexibility, accuracy, supporting standards and performance. A layer‐resolution of up to 32767×32767 pixels is supported. The described system is a flexible solution easy to be coupled with almost any system controller for a micro‐stereolithography machine using the integral irradiation process.