We introduce the drift‐diffusion model with appropriate jump conditions at the junction of the MODFET transistor (AlGaAs/GaAs). We propose a quasi‐variational inequality (QVI) model for this device. We assume that the electron density is bounded and piecewise constant. These hypotheses imply that the Poisson’s equation becomes linear with respect to the electrostatic potential. The QVI model keeps a coupling with the continuity equation. Free boundaries arise in the medium AlGaAs near the Schottky‐gate contact and in the high mobility medium (GaAs) under the effect of the electron affinity discontinuity at the junction. Numerical results of the QVI model show their location versus the applied gate voltage V/up> and the molar fraction X of the AlXGa(1‐X)As medium. The inequality seems to be a reasonable simplification of the non‐linear Poisson’s equation.
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1 June 1999
Conceptual Paper|
June 01 1999
A quasi‐variational inequality for the simulation of a MODFET transistor
François Lefèvre;
François Lefèvre
Université de Reims Champagne‐Ardenne, Reims, France
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Nabil Nassif
Nabil Nassif
Université de Reims Champagne‐Ardenne, Reims, France
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Publisher: Emerald Publishing
Online ISSN: 2054-5606
Print ISSN: 0332-1649
© MCB UP Limited
1999
COMPEL (1999) 18 (2): 175–186.
Citation
Lefèvre F, Nassif N (1999), "A quasi‐variational inequality for the simulation of a MODFET transistor". COMPEL, Vol. 18 No. 2 pp. 175–186, doi: https://doi.org/10.1108/03321649910264181
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