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SIMULATION OF COUPLED IMPURITIES DIFFUSION UNDER OXIDIZING CONDITIONS. APPLICATION TO THE OPTIMIZATION OF THE p‐WELLS IN CMOS TECHNOLOGY

Y. DEPEURSINGE, L. GUEX, J.M. MORET, P. WEISS

COMPEL (1983) 2 (4): 149–160.

https://doi.org/10.1108/eb009980

Published: 01 April 1983

View article titled, SIMULATION OF COUPLED IMPURITIES DIFFUSION UNDER OXIDIZING CONDITIONS. APPLICATION TO THE OPTIMIZATION OF THE p‐WELLS IN CMOS TECHNOLOGY

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