Social networking services provide users with effective tools to connect with others and manage increasingly large social networks. However, users often face a “connectivity paradox,” where the advantages of network expansion are offset by the role stress induced by these technologies. To address this paradox, this study employed the holistic technostress model to investigate the dual effects of technostress on users' lurking intention through the lens of perceived post-adoption regret.
Survey data were collected from 641 Chinese WeChat users. The model and hypotheses testing were conducted using SmartPLS 4.0.
The findings revealed that challenge technostressors (i.e. social interaction) reduce lurking intention by strengthening perceived tie strength, while hindrance technostressors (i.e. role stress) increase lurking intention by intensifying perceived impression management dissatisfaction. Furthermore, perceived impression management dissatisfaction can heighten perceived post-adoption regret, further amplifying lurking intention. Although perceived tie strength can partially alleviate lurking intention, strong perceived tie strength may paradoxically exacerbate them by increasing perceived post-adoption regret.
Anchored in the holistic technostress model, this study explores the impacts of challenge and hindrance technostress on users' lurking intention and uncovers the dual effects of social networking services (SNS) technological affordances in the post-adoption stage. Drawing on a role-based theoretical lens, this research further elucidates the underexamined “relationship-maintenance paradox” in the SNS context. By integrating the construct of post-adoption regret, the present study reconceptualizes lurking as a maladaptive coping strategy, which challenges the mainstream scholarly view that frames lurking as a normative and benign user behavior. This theoretical reframing offers an in-depth insight into lurking behaviors, clarifying that such behaviors essentially stem from users' negative emotional responses to role-related technostress.
