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Journal Articles

Model of boron diffusion in silicon used for solar cell fabrication based on boric acid solutions

Wojciech Filipowski

Microelectronics International (2023) 40 (4): 233–238.

https://doi.org/10.1108/MI-07-2021-0065

Published: 24 October 2022

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Journal Articles

Model of phosphorus diffusion in silicon for highly doped solar cell emitter layer

Wojciech Filipowski

Microelectronics International (2019) 36 (3): 104–108.

https://doi.org/10.1108/MI-12-2018-0079

Published: 20 June 2019

View article titled, Model of phosphorus diffusion in silicon for highly doped solar cell emitter layer

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Journal Articles

Borosilicate spray-on glass solutions for fabrication silicon solar cell back surface field

Wojciech Filipowski, Kazimierz Drabczyk, Edyta Wróbel, Piotr Sobik, Krzysztof Waczynski, Natalia Waczynska-Niemiec

Microelectronics International (2018) 35 (3): 172–176.

https://doi.org/10.1108/MI-12-2017-0075

Published: 02 July 2018

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Journal Articles

Relationship between resistance, TCR and stabilization temperature of amorphous Ni-P alloy

Wojciech Filipowski, Zbigniew Pruszowski, Krzysztof Waczynski, Piotr Kowalik, Jan Kulawik

Microelectronics International (2017) 34 (3): 154–159.

https://doi.org/10.1108/MI-12-2016-0090

Published: 07 August 2017

View article titled, Relationship between resistance, TCR and stabilization temperature of amorphous Ni-P alloy

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Journal Articles

Spray-on glass solution for fabrication silicon solar cell emitter layer

Wojciech Filipowski, Edyta Wrobel, Kazimierz Drabczyk, Krzysztof Waczynski, Grazyna Kulesza-Matlak, Marek Lipinski

Microelectronics International (2017) 34 (3): 149–153.

https://doi.org/10.1108/MI-12-2016-0089

Published: 07 August 2017

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Journal Articles

Comparison of diffused layer prepared using liquid dopant solutions and pastes for solar cell with screen printed electrodes

Kazimierz Drabczyk, Edyta Wróbel, Grazyna Kulesza-Matlak, Wojciech Filipowski, Krzysztof Waczynski, Marek Lipinski

Microelectronics International (2016) 33 (3): 167–171.

https://doi.org/10.1108/MI-03-2016-0031

Published: 01 August 2016

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Model of boron diffusion in silicon used for solar cell fabrication based on boric acid solutions

Model of phosphorus diffusion in silicon for highly doped solar cell emitter layer

Borosilicate spray-on glass solutions for fabrication silicon solar cell back surface field

Relationship between resistance, TCR and stabilization temperature of amorphous Ni-P alloy

Spray-on glass solution for fabrication silicon solar cell emitter layer

Comparison of diffused layer prepared using liquid dopant solutions and pastes for solar cell with screen printed electrodes

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