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Keywords: Atomic layer deposition
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Journal Articles
Journal:
Microelectronics International
Microelectronics International (2020) 37 (2): 87–93.
Published: 05 May 2020
..., a TiO2 blocking layer (BL) by atomic layer deposition (ALD) was deposited. Design/methodology/approach Scanning electron microscope, Raman and UV-Vis spectroscopy were used to evaluate the influence of BL on the photovoltaic properties. Electrical parameters of manufactured DSSCs with and without BL...
