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Keywords: Charge pumping
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Journal Articles
Journal:
Microelectronics International
Microelectronics International (2020) 37 (2): 103–107.
Published: 05 March 2020
... using silicon with 50-nm-thick AlOxNy films deposited on a silicon dioxide buffer layer via magnetron sputtering in which the gate dielectric was etched with wet solutions and/or dry plasma mixtures. Furthermore, the output, transfer and charge pumping (CP) characteristics were measured and compared...
