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Keywords: Line edge roughness (LER)
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Journal Articles
Journal:
Microelectronics International
Microelectronics International 1–10.
Published: 15 September 2026
...Shekhar Yadav Purpose This paper aims to introduce a statistical investigation for the three-dimensional line edge roughness ( LER ) resulting variation of 12 nm three-stacked nanosheet field-effect transistors. Design/methodology/approach An experimentally calibrated simulation framework...
