Update search
Filter
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
NARROW
Format
Journal
Type
Issue Section
Date
Availability
1-3 of 3
Keywords: Photoresists
Close
Follow your search
Access your saved searches in your account
Would you like to receive an alert when new items match your search?
Sort by
Journal Articles
Journal:
Microelectronics International
Microelectronics International (2006) 23 (3): 26–32.
Published: 01 September 2006
...@must.edu.tw © Emerald Group Publishing Limited 2006 Optimization techniques Coatings Photoresists Photolithography is the patterning process that transfers a design from a mask or reticle to the photo resist (PR) on the wafer surface. Photolithography was first used in the printing...
Journal Articles
Journal:
Microelectronics International
Microelectronics International (2000) 17 (3)
Published: 01 December 2000
... © MCB UP Limited 2000 --> Mattson Technology IMEC Photoresists Joint development targets future photoresist and residue removal for low-K and copper Keywords Mattson Technology, IMEC, Photoresists Mattson Technology, Inc. and IMEC have announced...
Journal Articles
Journal:
Microelectronics International
Microelectronics International (1997) 14 (1): 14–15(continued on page 19).
Published: 01 April 1997
...N. Imber; M. Hershcovitz; A. Ashur; I. E. Klein A study was undertaken to correlate macroscopic profile variations in the photoresist during lift‐off procedures with changes in material properties. It was established that soaking in chlorobenzene, which gave rise to negative slopes, was accompanied...
