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The Taguchi method is the conventional approach used in off‐line quality control. However, most previous Taguchi method applications have dealt only with a single‐response problem. The multi‐response problem has received only limited attention. Proposes an effective procedure on the basis of the quality loss of each response so as to achieve the optimization on multi‐response problems in the Taguchi method. The procedure is a universal approach which can simultaneously deal with continuous and discrete data. Evaluates a plasma‐enhanced chemical vapour deposition (PECVD) process experiment and a case study, indicating that the proposed procedure yields a satisfactory result.

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