Substrate transfer system
Substrate transfer system
Keywords: Substrate, Robotics, Patents
Applicant: Tazmo Co., Ltd, JapanPatent number: US6,514,032Publication date: 4 February 2003Title: Substrate Transfer System
This patent presents a substrate transfer system for transferring a work-piece such as a silicon wafer, a glass rectangular substrate for a photomask or a glass rectangular substrate for liquid crystal.
The system employs a conventional robot arm for transferring the work-piece. It comprises a base in which a driving source is built-in and a robot arm that is mounted on the base. The robot arm is a three-link structure and is composed in such a way that the sum of the length of the first arm and the third arm equals the length of the second arm, and the length of the first arm becomes longer than the length of the third arm. The ratio of the first, second and third arm lengths is approximately 1:(5 + 1)/2:(5 - 1)/2. This optimised ratio of the arm lengths allows the arm rotational radius to be smaller than the conventional value and makes it possible to achieve a longer transfer distance in an equal installation area.
