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Different techniques applied for the fabrication of thick‐film fine lines have been analysed. The basics, achievements, advantages and disadvantages of improved screen printing, screen printing with metal masks, the direct writing method, offset printing and photoformed or photoetched thick‐film are presented. In addition, current trends in front metallisation of silicon solar cells are described. Based on a critical review, the use of thick‐film fine lines for this purpose is discussed.

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