... measured with a micro ohmmeter. The composition and the morphology of the resistive layer of the structures examined was also determined. Findings The dependence of the resistance on the temperature of the stabilization process for the temperature range 553 to 623 K was described using mathematical...

... and demonstration of linear dependence between an increase in TCR of amorphic Ni–P alloy and stabilization temperature of resistive layer. Such correlations are not described in available literature. This work was aimed at studying the relationship between TCR values of Ni–P layers and the conditions...