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Keywords: Vacuum deposition
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Journal Articles
Journal:
Microelectronics International
Microelectronics International (1998) 15 (3): 31–35.
Published: 01 December 1998
...). This process is followed by vacuum deposition of relatively thick layers of Al (2‐5μm). Each layer is then processed by lithographic methods followed by selective electro‐chemical oxidation as a help process for structuring. The development of this combined structuring method allows the simultaneous...
